Low temperature processes for semiconductors have been recently under intensive development to fabricate controlled device structures with minute dimensions in order to achieve the highest device performance and new device functions as well as high integration density. Comprising reviews by experts long involved in the respective pioneering work, this volume makes a useful contribution toward maturing the process of low temperature epitaxy as a whole.5H2989 References Section IV 4.1 Technical Report, Mitsubishi Electric Corporation, ... 8Al 10 a#39; Torr Deposition Manual Manual Auto/Manual Vacuum system Manual Auto/Manual Auto/Manual Monitor Meter Me er Meter or CRT ( option) Poweranbsp;...
Title | : | Low Temperature Epitaxial Growth of Semiconductors |
Author | : | Takashi Hariu |
Publisher | : | World Scientific - 1991 |
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